Recent Journal Papers:
- S.-Y. Lee and Kasi Anbumony, "Accurate Control of Remaining Resist Depth for Nanoscale 3-D Structures in E-beam
Grayscale Lithograpphy," J. Vac. Sci. Technol., B25(6), pp.2008-2012, Nov/Dec 2007
- J. Kim, K. Jalhadi, S.-Y. Lee and D. Joy, "Fabrication of a Fresnel Zone Plate through E-beam Lithographic Process and its Application to Measuring of CD-SEM Performance," J. Vac. Sci. Technol., B22(6), pp.1771-1775, Nov/Dec 2007
- J. Kim, D.C. Joy and S.-Y. Lee, "Controlling resist thickness and etch depth for fabrication of 3D structures in electron-beam grayscale lithography," Microelectronic Engineering, 84/12, pp.2859-2864, 2007
- S.-Y. Lee and Kasi Anbumony, "Analysis of Three-Dimensional Proximity Effect in Electron-Beam Lithography," Microelectronic Engineering, 83/2, pp.336-344, 2005
- S.-Y. Lee, F. Hu and J. Ji, "Representation of nonrectangular features for exposure estimation and proximity effect correction in electron-beam lithography," J. Vac. Sci. Technol., B22(6), pp.2929-2935, Nov/Dec 2004
- F. Hu and S.-Y. Lee, "Dose control for
fabrication of grayscale structures using a single-step electron-beam lithographic process," J. Vac. Sci. Technol., B21(6), pp.2672-2679, Nov/Dec 2003