Recent Journal Papers:

Nak H. Kim and S.-Y. Lee, "Vision-based Approach to Automated Analysis of Structure Boundaries in Scanning Electron Microscope Images," J. Vac. Sci & Technol., B29(1), Jan/Feb, 2011.
P. Li, S.-Y. Lee, S. C. Jeon, J. S. Kim, K. N. Kim, M. S. Hyun, J. J. Yoo, and J. W. Kim, "Step Width Adjustment in Fabrication of Staircase Structures," J. Vac. Sci & Technol., B28(1), pp.30-35, Jan/Feb, 2010.
S.-Y. Lee, S. C. Jeon, J. S. Kim, K. N. Kim, M. S. Hyun, J. J. Yoo, and J. W. Kim, "Spatial Dose Control for Fabrication of Saw-tooth Structures,” J. Vac. Sci & Technol., B27(6), pp.2580-2584, Nov/Dec, 2009.
C. Guo, S.-Y. Lee, S. H. Lee, B.-G. Kim and H.-K. Cho, "Application of Neural Network to E-beam Dose Control for 3-D Proximity Effect Correction," J. Vac. Sci & Technol., B27(06), pp.2572-2579, Nov/Dec, 2009.
S.-Y. Lee and Kasi Anbumony, "Accurate Control of Remaining Resist Depth for Nanoscale 3-D Structures in E-beam Grayscale Lithograpphy," J. Vac. Sci. Technol., B25(6), pp.2008-2012, Nov/Dec 2007
J. Kim, K. Jalhadi, S.-Y. Lee and D. Joy, "Fabrication of a Fresnel Zone Plate through E-beam Lithographic Process and its Application to Measuring of CD-SEM Performance," J. Vac. Sci. Technol., B22(6), pp.1771-1775, Nov/Dec 2007
J. Kim, D.C. Joy and S.-Y. Lee, "Controlling resist thickness and etch depth for fabrication of 3D structures in electron-beam grayscale lithography," Microelectronic Engineering, 84/12, pp.2859-2864, 2007
S.-Y. Lee and Kasi Anbumony, "Analysis of Three-Dimensional Proximity Effect in Electron-Beam Lithography," Microelectronic Engineering, 83/2, pp.336-344, 2005
S.-Y. Lee, F. Hu and J. Ji, "Representation of nonrectangular features for exposure estimation and proximity effect correction in electron-beam lithography," J. Vac. Sci. Technol., B22(6), pp.2929-2935, Nov/Dec 2004
F. Hu and S.-Y. Lee, "Dose control for fabrication of grayscale structures using a single-step electron-beam lithographic process," J. Vac. Sci. Technol., B21(6), pp.2672-2679, Nov/Dec 2003