ELEC 7730 (Plasma Processing for Microelectronics), Fall 2003 Student Presentations:

1. Modeling and Simulation of Plasma - Jiehui Wan
2. Vapor Deposited Diamond Thin Films - Vivek Krishnan
3. Plasma Immersion Ion Implantation - Chris Seymore
4. Deep Etching Systems for Silicon and Silicon Dioxide - Robert Dean
5. Deposition of Coatings by PECVD - Jung-Hyun Park
6. Mechanical properties of diamond-like carbon films grown by plasma CVD - Liwei Wang
7. Sputtering Processes for Thin Film Deposition - Suiqiong Li
8. Anisotropic and Selective Plasma Etching process for Microelectronic Fabrication - Md Monirul Islam
9. Plasma Assisted Surface Modification - Maurice Clark
10. Plasma CVD Carbon Nanotubes (CNT’s) - Michael .A. Awaah
11. Copper Metallization Technology - Michael .A. Awaah
12. Plasma Generated Nano - Particles - Maurice Clark
13. Dusty Plasmas - Md Monirul Islam
14. Plasma Assisted Nanofabrication Processes - Suiqiong Li
15. Plasma-Induced Charging Damage of Gate Oxides - Jung Hyun Park
16. Room Temperature Plasma Assisted Wafer Bonding - Robert Dean
17. Trenches… - Chris Seymore
18. Plasma Assisted Nanofabrication Processes - Suiqiong Li
19. Processing of High-k Dielectric Materials - Vivek Krishnan
20. An Integrated Model for Si Etching - Jiehui Wan
21. Stress control of thin films in Plasma deposition - Liwei Wang
22. Low-K materials - Kejun Xia