phone: (334) 844-2559
fax: (334) 844-2063
227 Ross Hall
Auburn, AL 36849-5127
2003 - Ph.D., Chemical Engineering, University of California at Berkeley
1998 - B.ChE, Chemical Engineering, Auburn University
Microelectromechanical Systems, Surface Science, Microtribology, Thin Films, Surface Engineering, Microsystem Reliability, Microreactors
Selected Recent Publications
A. Anderson and W. R. Ashurst, "Investigation of a Vapor-Deposited Thin Silica Film: Morphological and Spectral Characterization", Langmuir, 24 (15), pp. 7947-7954, (2008).
A. Anderson and W. R. Ashurst, "Investigation of a Vapor-Deposited Thin Silica Film as a Novel Substrate for In Situ Fourier Transform Infrared Spectroscopy", Journal of Vacuum Science and Technology A, 26 (5), pp. 1357-1361, (2008).
A. Anderson and W. R. Ashurst, "Investigation of the Ability of a Silica 'Seed' Layer to Improve the Thermal and Aqueous Immersion Stability of Alkylsilane Monolayers on Silicon Surfaces", Thin Solid Films, 516 (21), pp. 7538-7546, (2008).
M. Anand, S. S. You, K. M. Hurst, S. R. Saunders, C. L. Kitchens, W. R. Ashurst and C. R. Roberts, "Thermodynamic Analysis of Nanoparticle Size Selective Fractionation Using Gas Expanded Liquids",Industrial and Engineering Chemical Research, 47 (3), pp. 553-559, (2008).
E. Flater, W. R. Ashurst and R. Carpick, "Nanotribology of octadecyltrichlorosilane monolayers and silicon: Self-mated vs. unmated interfaces and local packing density effects", Langmuir, 23 (18), pp. 9242-9252, (2007).